CVD Equipment Corporation · NASDAQ:CVV

CVD Equipment — Technical Presentation (2014)

24 slides from CVD Equipment's technical presentation, 2014

  1. Slide 1: Towards Industrial Scale Production of CVD Graphene

    Towards Industrial Scale Production of CVD Graphene RIJU SINGHAL, Ph.D., Applications Engineer Mathieu Monville, Ph.D., Applications Lab Manager Samuel Wright, Ph.D., Applications Engineer Karlheinz Strobl, Ph.D., V.P. Business Development www.cvdequipment.com 355 S. Technology Drive Central Islip,

  2. Slide 2: Operations and Manufacturing

    Operations and Manufacturing Operations (30+ years) ● Headquarters in Central Islip, NY ●  190 employees ● Recently moved into a 2X larger 130,000 square foot company owned facility CVD Equipment Corp. Headquarters Sales - Worldwide ● Direct sales ● Sales representatives ● Applications Laboratory ●

  3. Slide 3: We Sell Custom CVD Systems for Research and Production

    We Sell CUSTOM CVD Systems for Research and Production First Nano Systems for Research ● EasyTube® ● EasyGrapheneTM ● EasyGasTM ● EasyExhaustTM Applications of CVD Production Systems ● Photovoltaic ● Transparent Conductive Oxide (TCO) ● Reel-to-Reel CVD deposition ● Liquid Phase Epitaxial Deposition

  4. Slide 4: Commercialization of Nano-Structured Materials

    Commercialization of Nano-Structured Materials Commercialization Volume production Pilot production R&D Invention Need 4

  5. Slide 5: Wide range of CVD growth Substrates in use today

    Getting towards a UNIVERSAL solution: Low cost, High Volume, High Quality CVD Graphene Manufacturing! Foam Wide range of CVD growth Substrates in use today • Materials (Cu, Ni, Pt, Cu-Ni, Cu-Ag alloys, etc.) • Forms (solid, powders, fibrous, porous, etc.) • Shapes (thin film, thin sheet, roll of thi

  6. Slide 6: Wide range of CVD growth Substrates Size

    Getting towards a UNIVERSAL Low cost, High Volume, High Quality CVD Graphene Manufacturing Solution!   R&D Pilot Production Sheet Sheet Multiple Sheets or Roll Process Demo Application Demo 10-100 sheets, or 2-5 cm 20-30-60 cm 20-60 cm x 10-100m roll Wide range of CVD growth Substrates Size How to

  7. Slide 7: One of our Key Inspiration is YOUR Research work!

    Getting towards a UNIVERSAL Low cost, High Volume, High Quality CVD Graphene Manufacturing Solution! One of our Key Inspiration is YOUR Research work! 7

  8. Slide 8: Single Sheet Processing: Enclosure Box Solution

    Getting towards a UNIVERSAL Low cost, High Volume, High Quality CVD Graphene Manufacturing Solution: Single Sheet Processing The rest of our Inspiration is >30 years of know-how in custom CVD systems and solutions design and manufacturing! Proposed Single Cu Sheet Solution: • replace “Cu-foil-pocket

  9. Slide 9: Patent Pending Single Sheet Solutions compatible with ALL CVD tube furnaces

    Our Patent Pending, Single Sheet Solutions are compatible with ALL CVD tube furnaces Benefits of using the enclosure box (optimization ongoing) • Uniform thermal environment: acts as thermal integrating sphere to provide uniform temp. over large areas • Uniform reaction environment: diffusion of pro

  10. Slide 10: Results: Larger than 10 cm Cu grains

    Our Patent Pending, Single Sheet Solutions are compatible with CVD tube furnaces Results: (optimization ongoing) 1. Larger than 10 cm Cu grains!  Large zones of uniform crystallographic orientation of copper should result in more uniformity in graphene Importance of Cu crystallography to nucleation

  11. Slide 11: Results: Uniform monolayer graphene over large areas

    Our Patent Pending, Single Sheet Solutions are compatible with CVD tube furnaces Results: (optimization ongoing) 2. Uniform monolayer graphene over large areas  Large zones of uniform crystallographic orientation of copper should result in more uniformity in graphene  Minimal impurities (white par

  12. Slide 12: Results: Obtained > 3 mm graphene grains

    Our Patent Pending, Single Sheet Solutions are compatible with CVD tube furnaces Adapted from Seeded growth method: Gan et al, ACS Nano 2013, 7 (10), pp 9480 3. Obtained > 3 mm graphene grains!  Different process conditions yield different shapes of graphene nuclei, percentage coverage, and layer n

  13. Slide 13: Results: Different process conditions yield different graphene shapes

    Our Patent Pending, Single Sheet Solutions are compatible with CVD tube furnaces Adapted from ACCVD method: Zhao et al, ACS Nano, 2014, 8 (11), pp 11631 4. Different process conditions yield different shapes of graphene nuclei, percentage coverage, and layer numbers Multiple layers 1 layer 2 layers

  14. Slide 14: Crystal structure of individual graphene islands

    Crystal structure of individual graphene islands Method of investigation: Selected Area Electron Diffraction on CVD graphene islands transferred on a 3mm dia. TEM grid Research carried out in part at the Center for Functional Nanomaterials, Brookhaven National Laboratory, which is supported by the U

  15. Slide 15: Crystal structure of individual graphene islands

    Crystal structure of individual graphene islands NON-HEXAGONAL POLYGONAL ISLANDS HEXAGONAL ISLANDS POLYCRYSTALLINE SINGLE CRYSTAL CVD GRAPHENE CVD GRAPHENE Tilted: +30˚ Reference: 0˚ Tilted: +35˚ Research carried out in part at the Center for Functional Nanomaterials, Brookhaven National Laboratory,

  16. Slide 16: Parallel Sheet Processing

    Getting towards a UNIVERSAL Low cost, High Volume, High Quality CVD Graphene Manufacturing Solution: Parallel Sheet Processing   Proposed Multiple Cu Sheet Solution: • Parallel Processing: Vertically Stack thin Enclosure Boxes (Patent Pending) 16

  17. Slide 17: Parallel Sheet Processing: Stacked Substrates

    Getting towards a UNIVERSAL Low cost, High Volume, High Quality CVD Graphene Manufacturing Solution: Parallel Sheet Processing  Cu “liner”  CVD substrates Proposed Multiple Cu Sheet Solution: • Vertically stacked substrates sheets inside tall Enclosure Box (Patent Pending) 17

  18. Slide 18: Processing of Whole Roll of Flexible Substrate

    Getting towards a UNIVERSAL Low cost, High Volume, High Quality CVD Graphene Manufacturing Solution: Processing of whole    Archimedes Spiral wound Archimedes Roll CVD Substrate Roll in Enclosure Box Proposed Roll of flexible Substrate Processing in Batch CVD Tube Furnace with novel tooling resul

  19. Slide 19: Increasing Batch Size for Flexible Foil Substrate

    How to Increase the Batch Size for a given CVD Tube Furnace for a Flexible Foil Substrate Gap Do, D1  Roll Substrate Foil into an Archimedes Spiral PRIOR ART NEW SOLUTION (Patent pending) ●For online calculator see: http://www.giangrandi.ch/soft/spiral/spiral.shtml 19

  20. Slide 20: Maximum Substrate Length for Archimedes Spiral Foil Substrate

    Maximum Substrate Length for Archimedes Spiral Foil Substrate for 80% inner process tube diameter utilization Length of roll of Cu foil [m] in batch process enabled by proprietary tooling 150 135 0.5 mm gap 120 1 mm gap 105 4 mm gap 90 75 60 45 30 15 0 100 150 200 250 300 350 400 450 500 Process tub

  21. Slide 21: Roll to Roll vs Batch

    Roll to Roll Batch ● Roll width = ? ● Substrate size = ? ● Reel size = ? ● Cycle time = ? ● Line speed = ? ● Equipment development Cost + ● Equipment development Cost +++ ● Process development Cost + ● Process development Cost +++ ● Chemical delivery system + ● Chemical delivery system ++ ● Exhaust

  22. Slide 22: Family of EasyTube and EasyGraphene CVD Processing Systems

    Family of EasyTube® and EasyGraphene™ CVD Processing Systems CVD processing system family ● Scales CVD graphene processes in size and production volume with low execution risk ● Operates with a wider process window to manufacture CVD graphene at lower cost and/or time ● Enables the development of ne

  23. Slide 23: Case Study: CVD Graphene Volume Production for 300 mm wide Cu Foil

    Case Study: CVD Graphene Volume Production for 300 mm wide Cu Foil Roll to Roll CVD system: 300 mm process tube system 2 m long hot zone  Line speed = 4 m/h  Max production = 29 m2/24h New Archimedes Spiral Batch Process System: Improvement < 90 min heat up, < 45 min cool down Potential 15 min ann

  24. Slide 24: Summary

    Summary ● CVD Equipment Corporation continues to expand capabilities in: ● Equipment design ● Process development ● Material applications ● CVD Application Laboratory supports custom process and material development opportunities to advance the state of the art and pilot production scale-up demonstr

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