Adisyn Limited · ASX:AI1

Adisyn — Investor Presentation (January 2025)

21 slides from Adisyn's investor presentation, Jan 24, 2025

  1. Slide 1: Enabling the Future of Semiconductors

    For personal use only Enabling the Future of Semiconductors AI1:ASX Investor Presentation JA NU ARY 20 25 1

  2. Slide 2: Disclaimer

    Disclaimer For personal use only Disclaimer This information contained in this presentation has been prepared by Adisyn Ltd (ACN 155 473 304) (ASX:AI1 or Future performance any forward looking statements, opinions and estimates provided in this presentation are ‘the Company’) and makes statements ab

  3. Slide 3: Vision

    Vision For personal use only 2D Generation is now 100% 2D Generation develops novel technologies and methods to produce owned by Adisyn Ltd (AI1:ASX) high quality Graphene, in a low temperature process, improving the performance of semiconductor interconnects and other high technology applications.

  4. Slide 4: What's New? Non-Executive Director to be Appointed: Kevin Crofton

    What’s New? For personal use only Non-Executive Director to be Appointed: Kevin Crofton Kevin Crofton has 3 decades of Semiconductor • In 2006, Mr. Crofton led a P/E backed buyout of as Vice Chair and Chair. He was advisor to Senator industry experience. He has held significant Aviza Technology UK t

  5. Slide 5: What's New? M&T Semiconductor Partnership

    What’s New? M&T Semiconductor For personal use only Partnership 2D Generation Secures • M&T is incentivised to deliver strategic partnerships with equipment vendors, semiconductor fabricators, fabless Semiconductor Industry Heavy chipmakers and end users with the aim of securing Weights to Guide Bus

  6. Slide 6: What's New? Latest Beneq ALD Machine

    What’s New? Latest Beneq ALD Machine For personal use only New Generation Atomic Layer Deposition Machine Procured • 2D Generation has ordered a highly specialised Atomic Layer Deposition (“ALD”) machine from Beneq. The cutting-edge technology will enable 2DG to accelerate technological development

  7. Slide 7: What's New? Graphene applications in Photonics

    What’s New? Graphene applications in Photonics For personal use only Key Features of Graphene for Photonics: • Nonlinear Optical Response: Strong third-order nonlinearities. The future of semiconductors • Ultrafast Dynamics: Carrier relaxation in femtoseconds. • Broadband Absorption: Effective acros

  8. Slide 8: We are in an era driven by data, Artificial Intelligence and Connectivity

    We are in an era driven by data, Artificial Intelligence and Connectivity For personal use only 1990 2005 2020 2025 2030+ Internet Era Social Media Age Collaborative Autonomous Integrated World Economy Age Age www TODAY 8

  9. Slide 9: High Performance Computing's Primary Need Is The Quest for Speed

    High Performance Computing’s Primary Need (e.g., AI) Is The Quest for Speed… For personal use only …But limited by the ability to “shrink” design rules AMAT ITPC November 202 4 9

  10. Slide 10: The Industry "Must-Have" Solutions to Support The Coming Demands

    The Industry “Must-Have” Solutions to Support The Coming Demands For personal use only Semiconductor in AI 1 High Performance: Increasing Speed of device Requirements for high performance, low power AI semiconductors. 2 Low Power: Reducing Power Consumption 3 High Density: Smaller Chips of Stacked C

  11. Slide 11: What is an Interconnect?

    What is an Interconnect? For personal use only 2D Generation’s innovative technology centres around the aim of improving the performance and capabilities of the interconnect. • An interconnect in a semiconductor refers to the conductive pathways that connect different components or regions within an

  12. Slide 12: Why Graphene

    Why Graphene For personal use only Graphene is a unique carbon structure. It consists of a single atom layer of carbon atoms arranged in a honeycomb lattice and is the world’s first two-dimensional (2D) material. Graphene boasts exceptional properties, highly valuable to the semiconductor industry,

  13. Slide 13: 2D Generation's Process

    2D Generation’s For personal use only Process • Unique and patented process • ALD based • Forming graphene directly on the wafer • Use of patented precursors • Low-temperature process – below 280°C. • Compatible with current manufacturing limitations • An addition of a tethering group is designed to

  14. Slide 14: Our process advantages

    Our process advantages For personal use only Revolutionizes the Our innovative Atomic Layer Deposition (ALD) based semiconductor industry with process enabling graphene growth directly on silicon our patented, low-temperature chips at significantly lower temperatures, compatible with ALD process for

  15. Slide 15: The Copper Interconnect Dilemma

    The Copper Interconnect Dilema… For personal use only • Smaller and smaller design rules equals more transistors per chip – which means faster performance • But the inherent resistance increases to the point that processing speed is ultimately limited by physics Delay Process technology scale down *

  16. Slide 16: 2DG – Enabling the future of semiconductors

    2DG – Enabling the future For personal use only of semiconductors 2D Gen’s tech harnesses graphene’s unique properties to boost chip performance. Our graphene-based solution accelerates the development of new advanced computing tech, including artificial intelligence (AI), photonics, spintronics, an

  17. Slide 17: Building the Future Together: Partnership Opportunities

    Building the Future Together: For personal use only Partnership Opportunities 17

  18. Slide 18: Connecting Chips – EU Undertaking

    Connecting Chips – For personal use only EU Undertaking Why is the Project significant? 2DG’s role in the Project • The Project is focused on developing and integrating Leveraging graphene’s exceptional properties through electronic, photonic, power, and RF devices within pioneering low-temperature

  19. Slide 19: 2DG Intellectual Property

    2DG Intellectual Property For personal use only Four patent families are GRAPHENE COATED NON-METALLIC SURFACES, DEVICES AND METHOD directed to the technology of the Company and each patent 1 THEREOF – directed to the technologies used for conductive diffusion barrier, and other applications is compo

  20. Slide 20: 2D Generation's Strong Management Team

    2D Generation’s Strong Management Team For personal use only ARYE KOHAVI Founder, CEO MIRI KISH DAGAN VP R&D PAUL RICH Technology Leader Arye is an Israeli entrepreneur and innovator. He was Miri Kish - Dagan was the VP R&D and the CTO of Paul Rich has more than 35 years of experience in the the fou

  21. Slide 21: Thank you

    For personal use only Enabling the Future of Semiconductors AI1:ASX Thank you C ON TAC T D ETAILS Blake Burton – Managing Director, AI1 David Tasker – IR / PR [email protected] [email protected] Arye Kohavi – CEO, 2D Generation Michael Shaw-Taylor – Corporate Advisor 2DGenerati

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