Silvaco Group, Inc. · NASDAQ:SVCO
Silvaco — Technical Presentation (2023)
10 slides from Silvaco's technical presentation, Jan 13, 2023
Slide 1: The Four Process Simulation Options Modeling
The Four Process Simulation Options Modeling Geometric Emulation Physical
Slide 2: Contents
Contents • Four Process Simulation Options 1. Solid modelling approach 2. Fast prototyping builder using geometric style etch/deposit 3. Topographical (rule based) process emulation etch/deposit 4. Simulation of chamber physics for etch/deposit/oxidize • Other physics or rule based options for impla
Slide 3: Four Process Simulation Options
Four Process Simulation Options • The purpose of a process simulator is to create a virtual representation of a physical structure. • There are four basic ways to create the structure: 1. Solid modelling (assembly of geometric shapes) 2. Process simulation using geometric style etch/deposit 3. Use a
Slide 4: Solid Modeling Approach
Solid Modeling Approach • In this most basic approach, various shapes are created using a solid modelling tool which are then “stitched” together to form the basic simulated structure • An exploded diagram (left) shows constituent parts of a FinFET structure created entirely using solid modeling ©20
Slide 5: Geometric Operations for Etch/Deposit
Geometric Operations for Etch/Deposit • After loading mask data, the process run sheet is followed to create the structure but etch and deposit steps are limited to geometric functions of the masking layers • Fast prototyping simulations of large structures are possible ©2023 Silvaco, Inc. 5
Slide 6: Topographical Process Emulation
Topographical Process Emulation • After loading mask data, the process run sheet is followed to create the structure as before • However, an Emulation style engine uses topographic based mathematical functions, to create more complex conformal layer deposit and rounded etch shapes ©2023 Silvaco, Inc
Slide 7: Chamber Physics Simulation for Etch/Deposit/Oxidation
Chamber Physics Simulation for Etch/Deposit/Oxidation • A step towards further predictable simulation, is to simulate the basic etch/deposit chamber physics • Typical inputs for the model are material and incoming particle angular dependency of etch/deposit rates, sticking coefficients, polymer re d
Slide 8: Other Physics or Rule Based Options
Other Physics or Rule Based Options • Silvaco also provides physics or rule based model options, for implant, diffuse and oxidation process steps • This mix and match approach facilitates very flexible structure creation techniques ©2023 Silvaco, Inc. 8
Slide 9: Integrated Stress Analysis
Integrated Stress Analysis • Structure stress can be analyzed at key points during structure creation, or at every step during the structure creation process flow (“stress history” feature) ©2023 Silvaco, Inc. 9
Slide 10: Summary
Summary • Four process simulation options are available • Physics or rule based options for implant/diffuse • 3D physics based crystal direction dependent oxidation • Mix and match approach facilitates great flexibility • One tool set for large geometric structures, and detailed analysis of etch, de