CVD Equipment Corporation · NASDAQ:CVV
CVD Equipment — Technical Presentation (2015)
25 slides from CVD Equipment's technical presentation, 2015
Slide 1: Large-scale Production of AB-Stacked Bilayer Graphene Using Ethanol as Precursor
Large-scale Production of AB-Stacked Bilayer Graphene Using Ethanol as Precursor Karlheinz Strobl, V.P. of Business Development M at h i e u M o nv i l l e , R i j u S i n g h a l , a n d S a m u e l Wr i g ht MRS Spring 2015 enabling tomorrow’s technologies™
Slide 2: Facilities
Facilities Headquarters – Central Islip, NY Application Lab – Central Islip, NY SDC Division – Saugerties, NY 130,000 ft2 facility 6,000 ft2 facility 22,000 ft2 facility with 4,000 ft2 cleanrooms 2 MRS Spring 2015 enabling tomorrow’s technologies™
Slide 3: CVD = Chemical Vapor Deposition
CVD = Chemical Vapor Deposition = Chemistry + Temperature + Pressure Control Chemical Vapor Deposition is the controlled decomposition of gases used to deposit a material onto a surface Requires multidisciplinary engineering: process chamber design, temperature control, gas and vapor flow, press
Slide 4: CVD Systems for Research and Production
CVD Systems enabling tomorrow’s technologies™ for Research and Production FirstNano™ R&D Systems EasyTube® processing EasyGas™ gas delivery EasyExhaust™ abatement CVD Equipment Production Systems Chemical vapor infiltration Transparent conductive oxides (TCOs) Liquid phase epitaxial
Slide 5: Commercialization of Nano-Structured Materials
Commercialization of Nano-Structured Materials 5 MRS Spring 2015 enabling tomorrow’s technologies™
Slide 6: Nanomaterials & Applications
Nanomaterials & Applications Vertically aligned silicon nanowires Random carbon Batteries nanowires Silicon Large flat wafer panel display Computer component 6 MRS Spring 2015 enabling tomorrow’s technologies™
Slide 7: How to get to a Universal Low Cost, High Volume CVD Graphene Manufacturing Solution
How to get to a UNIVERSAL Low cost, High Volume, High or higher Quality CVD Graphene Manufacturing Solution WAFER FOIL ROLL FOAM Wide range of CVD growth Substrates in use today Materials (Cu, Ni, Pt, Cu-Ni, Cu-Ag alloys, etc.) Forms (solid, porous, etc.) Shapes (thin film, thin sheet, roll of
Slide 8: How to get to a Universal Low Cost, High Volume CVD Graphene Manufacturing Solution
How to get to a UNIVERSAL Low cost, High Volume, High or higher Quality CVD Graphene Manufacturing Solution R&D PILOT PRODUCTION Sheet Process Demo Sheet Application Demo Multiple Sheets or Roll 2-5 cm 20-30-60 cm 10-100 sheets, or 20-60 cm x 10-100m roll Wide range of CVD growth Substrates Size How
Slide 9: Take Research Innovations and RE-engineer them to be Practical
Take Research Innovations and RE-engineer them to be Practical 1st Step: Inspiration from YOUR Research ‘Copper enclosure’ A copper pocket Is made by folding a piece of copper foil (99.8% Alfa Aesar) and crimping the three edges. The copper enclosure is placed in the tube furnace for graphene growth
Slide 10: Take Research Innovations and RE-engineer them to be Practical
Take Research Innovations and RE-engineer them to be Practical 2nd Step: More Inspirations from YOUR Research! Which one is more important than others? Can such different process be done on same platform? Equilibrium Chemical Vapor Deposition Growth of Bernal-Stacked Bilayer Graphene using Ethanol a
Slide 11: How to develop a Universal, Multipurpose Graphene Manufacturing Solution?
How to develop a UNIVERSAL, Multipurpose Low cost, High Volume, High Quality Graphene Manufacturing Solution? 3rd Step: Apply our 33 years of know-how in custom CVD system design, solutions, and manufacturing to develop practical solutions “Cu-foil-pocket” Enclosure Box Proposed universal graphene p
Slide 12: Our Patent Pending Single Sheet Solutions are compatible with CVD tube furnaces
Our Patent Pending, enabling tomorrow’s technologies™ Single Sheet Solutions are compatible with CVD tube furnaces Benefits: (optimization still ongoing) Cu “liner” Enclosure Box acts as thermal integrating sphere providing large area thermal uniformity Diffusion of process gas into box through
Slide 13: Our Patent Pending Single Sheet Solutions are compatible with CVD tube furnaces
Our Patent Pending, enabling tomorrow’s technologies™ Single Sheet Solutions are compatible with CVD tube furnaces Benefits: (optimization still ongoing) Enables > 10 cm Cu grains Enables > mm size single crystal graphene grains Enables a mixture of high and low pressure processes without usua
Slide 14: What is the crystal structure of individual graphene islands?
What is the crystal structure of individual graphene islands? Method of investigation: Selected Area Electron Diffraction on CVD graphene islands transferred on a 3 mm diameter TEM grid Research carried out in part at the Center for Functional Nanomaterials, Brookhaven National Laboratory, which is
Slide 15: What is the crystal structure of individual graphene islands?
What is the crystal structure of individual graphene islands? HEXAGONAL ISLANDS SINGLE CRYSTAL CVD GRAPHENE NON-HEXAGONAL POLYGONAL ISLANDS POLYCRYSTALLINE CVD GRAPHENE Tilted: +30˚ Tilted: +35˚ Reference: 0˚ Research carried out in part at the Center for Functional Nanomaterials, Brookhaven Nationa
Slide 16: Proposed Multiple Cu Sheets Solution: Parallel Processing
How to get to a UNIVERSAL Low cost, High Volume, High or higher Quality CVD Graphene Manufacturing Solution! Proposed Multiple Cu Sheets Solution: Parallel Processing: Vertically Stack thin Enclosure Boxes (Patent Pending) 16 MRS Spring 2015 enabling tomorrow’s technologies™
Slide 17: Vertically Stacked Substrate Sheets Inside Tall Enclosure Box
How to get to a UNIVERSAL Low cost, High Volume, High or higher Quality CVD Graphene Manufacturing Solution! Cu “liner” CVD substrates Proposed Multiple Cu Sheets Solution: Vertically stacked substrates sheets inside tall Enclosure Box (Patent Pending) 17 MRS Spring 2015 enabling tomorrow’s technolo
Slide 18: Roll of Flexible Substrate in Batch CVD Tube Furnace
How to get to a UNIVERSAL Low cost, High Volume, High or higher Quality CVD Graphene Manufacturing Solution! Archimedes Spiral wound Archimedes Roll CVD Substrate Roll in Enclosure Box Proposed Roll of flexible Substrate Processing in Batch CVD Tube Furnace with novel tooling resulting in Arichmedes
Slide 19: How to Increase the Batch Size for a CVD Tube Furnace
How to Increase the Batch Size for a given CVD Tube Furnace for a Flexible Foil Substrate Gap Do, D1 Roll Substrate Foil into an Archimedes Spiral Prior Art New Solution (Patent pending) For online calculator see: http://www.giangrandi.ch/soft/spiral/spiral.shtml 19 MRS Spring 2015 enabling tomorrow
Slide 20: Maximum Substrate Length for Archimedes Spiral Foil Substrate
Maximum Substrate Length for Archimedes Spiral Foil Substrate for 80% inner process tube diameter utilization Length of roll of Cu foil [m] in batch process 150 enabled by proprietary tooling 135 0.5 mm 120 gap 1 mm 105 gap 90 75 60 45 30 15 0 100 150 200 250 300 350 400 450 500 PROCESS TUBE DIAMETE
Slide 21: EasyTube CVD Processing Systems
enabling tomorrow’s technologies™ EasyTube®CVD Processing Systems Scales CVD graphene processes in size and production volume with low execution risk Operates with a wider process window to 50 mm Substrate 100 mm Substrate manufacture CVD graphene at lower cost and/or time Enables the developm
Slide 22: Many CVD Processes Need a Substrate to Grow Nano-Structured Materials
Many CVD Processes Need a Substrate to Grow High Quality Nano-Structured Materials 2D Graphene 1D Nano Materials CVD Graphene on Cu foil VACNT on SS foil VASiNW on Si (111) RASiNW on SS foil 22 MRS Spring 2015 enabling tomorrow’s technologies™
Slide 23: Case Study: Graphene Volume Production for 300 mm Wide Cu Foil
Case Study: CVD enabling tomorrow’s technologies™ Graphene Volume Production for 300 mm wide Cu Foil Roll to Roll CVD system: 15 or 30 min annealing + 15 or 30 min growth @ 1040 C, AP or LP 2 m long hot zone Line speed = 4 or 2 m/h Max production = 29 or 14 Improvement Potential m2/24h 5-9X pr
Slide 24: First Step in Bi-Layer Scale up
First Step in Bi-Layer Scale up: duplication of Prior Art paper utilizing Ethanol As C-precursor to make Bi-layer Graphene (without enclosure box) > 60% bi-layer coverage 24 MRS Spring 2015 enabling MRS Spring 2015 tomorrow’s technologies™
Slide 25: Summary
Summary CVD Equipment Corporation continues to expand capabilities in: Equipment design and process control Process development Material applications We presented a multipurpose, patent pending, equipment platform that has the potential to be a more universal solution for: Multipurpose Mono, b